I  U  P  A  C

 

 

 

News & Notices

Organizations & People

Standing Committees

Divisions

Projects

Reports

Publications
. . CI
. . PAC
. . Macro. Symp.

. . Books
. . Solubility Data

Symposia

AMP

Links of Interest

Search the Site

Home Page

 

Pure Appl. Chem. Vol. 74, No. 3, pp. 317-509 (2002)

Pure and Applied Chemistry

Vol. 74, Issue 3


Plenary and topical lectures presented at the 15th International Symposium on Plasma Chemistry, Orléans, France, 9-13 July 2001

IUPAC Recommendations and Technical Reports

Plenary and topical lectures presented at the 15th International Symposium on Plasma Chemistry, Orléans, France, 9-13 July 2001

Preface, A. Bouchoule and J.-M. Pouvesle

Invited Plenary Lectures

Energy transfers by long-lived species in glows and afterglows, S. De Benedictis and G. Dilecce
p. 317 [Abstract] [full text - pdf 274KB]

New approaches in thermal plasma technology, J. Heberlein
p. 327 [Abstract] [full text - pdf 211KB]

Nonequilibrium discharges in air and nitrogen plasmas at atmospheric pressure, C. H. Kruger, C. O. Laux, L.Yu, D. M. Packan, and L. Pierrot
p. 337 [Abstract] [full text - pdf 563KB]

Plasma sterilization. Methods and mechanisms, M. Moisan, J. Barbeau, M.-C. Crevier, J. Pelletier, N. Philip, and B. Saoudi
p. 349 [Abstract] [full text - pdf 311KB]

Plasma production of nanocrystalline silicon particles and polymorphous silicon thin films for large-area electronic devices, P. Roca i Cabarrocas, A. Fontcuberta i Morral, S. Lebib, and Y. Poissant
p. 359 [Abstract] [full text - pdf 392KB]

Plasma processing and chemistry, D. C. Schram
p. 369 [Abstract] [full text - pdf 292KB]

Study for plasma etching of dielectric film in semiconductor device manufacturing. Review of ASET research project, M. Sekine
p. 381 [Abstract] [full text - pdf 495KB]

Invited Topical Lectures

Diagnostics of etching plasmas, J.-P. Booth
p. 397 [Abstract] [full text - pdf 178KB]

Role of ions in SiO2 deposition with pulsed and continuous helicon plasmas, C. Charles
p. 401 [Abstract] [full text - pdf 213KB]

Diagnostics and insights on PECVD for gas-barrier coatings, M. Creatore, F. Palumbo, and R. d’Agostino
p. 407 [Abstract] [full text - pdf 228KB]

Plasma-assisted production of hydrogen from hydrocarbons, M. Deminsky, V. Jivotov, B. Potapkin, and V. Rusanov
p. 413 [Abstract] [full text - pdf 211KB]

Ion-induced damage and annealing of silicon. Molecular dynamics simulations, D. Humbird and D. B. Graves
p. 419 [Abstract] [full text - pdf 239KB]

Plasma treatment of textile fibers, H. Höcker
p. 423 [Abstract] [full text - pdf 298KB]

Generation of thermal plasmas in liquid-stabilized and hybrid dc-arc torches, M. Hrabovsky
p. 429 [Abstract] [full text - pdf 236KB]

Nonthermal and nonequilibrium effects in high-power pulsed ICP and application to surface modification of materials, T. Ishigaki, N. Okada, N. Ohashi, H. Haneda, and T. Sakuta
p. 435 [Abstract] [full text - pdf 266KB]

Splat formation in plasma-spray coating process, J. Mostaghimi and S. Chandra
p. 441 [Abstract] [full text - pdf 198KB]

Ultrashort pulsed barrier discharges and applications, K. Okazaki and T. Nozaki
p. 447 [Abstract] [full text - pdf 298KB]

"Simple" diagnostics for characterization of low-pressure chemically active plasmas, D. K. Otorbaev
p. 453 [Abstract] [full text - pdf 140KB]

Comparative characterization of high-density plasma reactors using emission spectroscopy from VUV to NIR, Y.-K. Pu, Z.-G. Guo, Z.-D. Kang, J. Ma, Z.-C. Guan, G.-Y. Zhang, and E.-G.Wang
p. 459 [Abstract] [full text - pdf 196KB]

Excilamps as efficient UV-VUV light sources, V. F. Tarasenko
p. 465 [Abstract] [full text - pdf 142KB]

Plasma synthesis of catalytic thin films, A.-L. Thomann, J. P. Rozenbaum, P. Brault, C. Andreazza, P. Andreazza, B. Rousseau, H. Estrade-Szwarckopf, A. Berthet, J. C. Bertolini, F. J. Cadete Santos Aires, F. Monnet, C. Mirodatos, C. Charles, and R. Boswell
p. 471 [Abstract] [full text - pdf 197KB]

Superhard nanocomposite coatings. From basic science toward industrialization, S. Veprek and M. Jilek
p. 475 [Abstract] [full text - pdf 248KB]

Clustering phenomena in low-pressure reactive plasmas. Basis and applications. Y.Watanabe, M. Shiratani, and K. Koga
p. 483 [Abstract] [full text - pdf 189KB]

How to exploit ion-induced stress relaxation to grow thick c-BN films, P. Ziemann, H.-G. Boyen, N. Deyneka, P. Widmayer, and F. Banhart
p. 489 [Abstract] [full text - pdf 169KB]

IUPAC Recommendations and Technical Reports

Definitions of basic terms relating to polymer liquid crystals, [IUPAC Recommendations 2001], M. Barón and R. F. T. Stepto
p. 493 [Abstract] [full text - pdf 401KB]


 

Page last modified 17 April 2002.
Copyright © 2002 International Union of Pure and Applied Chemistry.
Questions or comments about IUPAC, please contact, the Secretariat.
Questions regarding the website, please contact web manager.