Plasma synthesis of catalytic thin films*
A.-L. Thomann1,**, J. P. Rozenbaum1, P. Brault1, C. Andreazza2, P.
Andreazza2, B. Rousseau2, H. Estrade-Szwarckopf2, A. Berthet3, J. C.
Bertolini3, F. J. Cadete Santos Aires3, F. Monnet3, C. Mirodatos3, C.
Charles4, and R. Boswell4
1GREMI UMR 6606 CNRS, Université d'Orléans
BP 6744 ORLEANS Cedex 2, France; 2CRMD, UMR 6619 CNRS, 45067 ORLEANS
Cedex 2, France; 3IRC UPR 5401 CNRS, Av. A. Einstein; F-69626 VILLEURBANNE
Cedex, France; 4Space Plasma and Plasma Processing, Plasma Research
Laboratory, The Australian National University, Canberra ACT 0200, Australia
Abstract: Plasma sputter deposition is introduced in the field
of catalyst preparation. It is shown that growth kinetics and morphologies
are determined by ion to neutral flux ratio and kinetic energies of
sputtered atoms. Catalytic activity of such catalysts compares very
well with classical catalysts.
* Lecture presented at the 15th International Symposium
on Plasma Chemistry, Orléans, France, 9-13 July 2001. Other presentations
are presented in this issue, pp. 317492.
** Corresponding author.
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