Preface*
Selected by the International Organizing Committee,
these invited plenary and topical lectures illustrate the significant
progress that is taking place in various topics covered by the symposium.
The expanding science and technologies concerned with plasma chemistry
were evidenced at this conference by a large number of participants
(624 from 44 countries).
These selected invited lectures have been really
appreciated by the symposium participants, and the speakers are acknowledged
for the quality of their talks. The publication of their lectures in
this issue of Pure and Applied Chemistry (PAC) was done after
peer reviews of manuscripts, and the editors would acknowledge all the
authors of their contributions and also the reviewers for their help.
This issue of PAC presents an overview on many areas,
from fundamental elementary processes to plasma processing, from experimental
research to modeling developments. Recent advances in basic science
and applications relevant to thermal plasmas and nonequilibrium atmospheric
or low-pressure plasmas are reviewed in plenary lectures, and more specific
developments on material and surface processing, gas treatments, biotechnology,
light sources, etc. are presented in topical lectures. This overview
will offer to scientists, and also R&D engineers, concerned at large
by plasma chemistry, useful updated information on the present developments
in this area of science and technology.
A. Bouchoule
J.-M. Pouvesle
Symposium
Editors
*Lecture presented at the 15th International
Symposium on Plasma Chemistry, Orl�ans, France, 9-13 July 2001. Other
presentations are presented in this issue, pp. 317�492.
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